Implant doping region - Simulation object

The Implant doping object allows the user to define a region with a doping profile created by ion implantation. The region geometry as well as parameters can be entered.

 
Screen-shot of the implant doping object showing the center, span, and angle of implantation.

General tab

Source

• DOPANT TYPE: The dopant type can be n-type (donors) or p-type (acceptors).
• PEAK CONCENTRATION (1/cm3): Peak value of doping density in 1/cm3.
• SOURCE THETA (deg):The angle of implantation, measured in degrees, with respect to the surface normal axis defined in Geometry tab.
• SOURCE PHI (deg):The angle of implantation, in degrees, rotated about the surface normal axis in a right-hand context.

Implant Distribution

• DISTRIBUTION FUNCTION: Analytic function used to describe the dopant distribution profile along the angle of implantation. Options are 1-D Gaussian or Pearson IV distribution.
• RANGE (μm): Average depth of ion penetration, equivalent to the mean of the distribution function
• STRAGGLE (μm): Standard deviation of ion penetration around the mean. For a Gaussian distribution, straggle is the distance from peak density (range) where its value is 1/exp(0.5) ~ 0.606 of the peak density.

• SKEWNESS:

• third standardized moment
• active only for the Pearson IV distribution function
• the skewness must satisfy the relation \( 0\leq\gamma_1^2<32 \). A symmetric distribution function has skewness \( \gamma_1 = 0 \)

• KURTOSIS:

• is a measure of the probability of outliers
• fourth standardized moment
• active only for the Pearson IV distribution function
• the kurtosis must satisfy the relation \( \beta_{2}>\frac{39\gamma_1^2+6(\gamma_1^2+4)^{3/2}+48}{32-\gamma_1^2} \). The kurtosis must always satisfy \( \beta_2 > 3 \)
• when the kurtosis is not known, \( \beta_2 \simeq 3 + 2.4\gamma_1^2 \) can be used
• LATERAL SCATTER (μm): Standard deviation of dopants in the lateral plane (orthogonal to the source direction). The distribution function is Gaussian.

The distribution is applied from the injection surface (indicated by the green plane). If necessary the applicable domain option can be utilized to have the doping profile begin at different levels (more information presented in this post).

Right Panel:

The plot shows a 1-D profile of the doping in the implant direction as the distribution model parameters are changed.

Geometry tab

• SURFACE NORMAL: X, Y or Z. This is the surface normal of the 2-D mask.
• X, Y, Z: The center position of the object
• USE RELATIVE COORDINATES:  If this is enabled then the object will use the center or the simulation region as its origin (reference).  If disabled then it will use the absolute center (0,0,0) as its origin.
• VERTICES:
• ADD, DELETE: Add, delete vertices
• APPLICABLE DOMAINS: This can be used to limit the volume over which the imported object is applicable.
• SOLID : Select the target solid. The reference geometry is the surfaces that enclose the selected volume if the solid is a 3D shape, or the surface if the solid is a 2D plane.  
• DOMAIN : Select the target domain. The reference geometry is the surfaces of the selected domain.
• ALL DOMAINS: The object will be applied to all the available domains.